Home > Instruments > Sample Preparation > Plasma/UV Cleaner/Etching/Asher

Plasma Cleaner

Model:Solarus II 955
Spec:2-65W Ar O2 H2
File (PDF):Not yet uploaded

This system is ideal for researchers who want to reproducibly remove organic surface contaminants in a safe, efficient manner.

  • Integrated holder bakeout and storage: Reduces tool footprint and cost of ownership
  • Enhanced user interface: Use preoptimized recipes for consistent results; as well as guided workflows to ensure proper operation when venting and evacuating the chamber
  • Low-power operation (2 W): Gently clean delicate samples (e.g., holey carbon grids); as well as prepare hydrophilic surfaces on carbon grids for cryo-electron microscopy
  • New system, same great performance: Remove hydrocarbons on TEM and SEM samples that may impact analysis

[ Back ]
GATAN Inc. /U.S.A.
Oxford Instruments/U. K.
SPI Supplies/U. S. A.
tousimis/U. S. A.
System in Frontier Inc /Japan
Micro Support Co.,Ltd/Japan
Protochips Inc/U.S.A.
Deben UK Ltd.